Spectroscopic and capacitance-voltage characterization of thin aminopropylmethoxysilane films doped with copper phthalocyanine,…

Publication year: 2011 Source: Applied Surface Science, Available online 21 December 2011 Jolanta Klocek, Karsten Henkel, Krzysztof Kolanek, Ehrenfried Zschech, Dieter Schmeißer We report on studiesaboutnovel 3-aminopropyltrimethoxysilane (APTMS) based hybrid composites doped by copper phthalocyanine(CuPc), [6,6]-phenyl-C61-butyric acid methyl ester and tris(dimethylvinylsilyloxy)-POSS (POSS).APTMSwasused as siloxane matrix in order to produce thin layers of composite materials spin-coated ontosilicon.The surface chemistry and the dielectric properties were investigated by the combination of X-ray photoelectron spectroscopyand capacitance voltage technique.We observed strong correlations between the dopantconcentration and the chemical composition, homogeneity andelectrical properties (permittivity, hysteresis) of the produced layers. Hence, an increase of the surfaces chemical resistance against the ambient conditions due to the POSS incorporation into the siloxane matrix was found

Publication year: 2011 Source: Applied Surface Science, Available online 21 December 2011 Jolanta Klocek, Karsten Henkel, Krzysztof Kolanek, Ehrenfried Zschech, Dieter Schmeißer We report on studiesaboutnovel 3-aminopropyltrimethoxysilane (APTMS) based hybrid composites doped by copper phthalocyanine(CuPc), [6,6]-phenyl-C61-butyric acid methyl ester and tris(dimethylvinylsilyloxy)-POSS (POSS).APTMSwasused as siloxane matrix in order to produce thin layers of composite materials spin-coated ontosilicon.The surface chemistry and the dielectric properties were investigated by the combination of X-ray photoelectron spectroscopyand capacitance voltage technique.We observed strong correlations between the dopantconcentration and the chemical composition, homogeneity andelectrical properties (permittivity, hysteresis) of the produced layers. Hence, an increase of the surfaces chemical resistance against the ambient conditions due to the POSS incorporation into the siloxane matrix was found

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Spectroscopic and capacitance-voltage characterization of thin aminopropylmethoxysilane films doped with copper phthalocyanine,…