Publication year: 2011 Source: Chemical Physics, Available online 6 September 2011 A. Gicquel, N. Derkaoui, C. Rond, F. Benedic, G. Cicala, … Optical emission spectroscopy has been used to characterize diamond deposition microwave chemical vapour deposition (MWCVD) plasmas operating at high power density. Electron temperature has been deduced from H atom emission lines while H-atom mole fraction variations have been estimated using actinometry technique, for a wide range of working conditions: pressure [25-400] hPa and MW power [600-4000] W.
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Quantitative analysis of diamond deposition reactor efficiency