Maskless pattern transfer using 355 nm laser

Publication year: 2011 Source: Optics and Lasers in Engineering, Available online 22 December 2011 S.R.I. Gabran, R.R. Mansour, M.M.A. Salama Low power near-ultraviolet laser can be employed in various pattern transfer techniques such as maskless lithography and organic film ablation. Laser maskless lithography allows rapid prototyping using thin as well as thick photoresist films

Publication year: 2011 Source: Optics and Lasers in Engineering, Available online 22 December 2011 S.R.I. Gabran, R.R. Mansour, M.M.A. Salama Low power near-ultraviolet laser can be employed in various pattern transfer techniques such as maskless lithography and organic film ablation. Laser maskless lithography allows rapid prototyping using thin as well as thick photoresist films

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Maskless pattern transfer using 355 nm laser