Effects of electron irradiation on the properties of GZO films deposited with RF magnetron sputtering

Publication year: 2011 Source: Applied Surface Science, Available online 21 December 2011 Y.S. Kim, S.B. Heo, H.M. Lee, Y.J. Lee, I.S. Kim, … Transparent conductive GZO films were deposited on polycarbonate substrates by electron beam assisted radio frequency (RF) magnetron sputtering and then the influence of electron irradiation on the structural, optical and electrical properties of GZO films was investigated by using X-ray diffractometry, UV-Vis spectrophotometry, four point probes, atomic force microscopy and UV photoelectron spectroscopy. Sputtering power was kept constant at 3 W/cmduring deposition, while electron irradiation energy varied from 450 to 900 eV.Electron irradiated GZO films show larger grain sizes than those of films prepared without electron irradiation, and films irradiated at 900 eV show higher optical transmittance in the visible wavelength region and lower sheet resistance (120 Ω/□) than other films

Publication year: 2011 Source: Applied Surface Science, Available online 21 December 2011 Y.S. Kim, S.B. Heo, H.M. Lee, Y.J. Lee, I.S. Kim, … Transparent conductive GZO films were deposited on polycarbonate substrates by electron beam assisted radio frequency (RF) magnetron sputtering and then the influence of electron irradiation on the structural, optical and electrical properties of GZO films was investigated by using X-ray diffractometry, UV-Vis spectrophotometry, four point probes, atomic force microscopy and UV photoelectron spectroscopy. Sputtering power was kept constant at 3 W/cmduring deposition, while electron irradiation energy varied from 450 to 900 eV.Electron irradiated GZO films show larger grain sizes than those of films prepared without electron irradiation, and films irradiated at 900 eV show higher optical transmittance in the visible wavelength region and lower sheet resistance (120 Ω/□) than other films

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Effects of electron irradiation on the properties of GZO films deposited with RF magnetron sputtering