Chemical vapor deposition of boron- and nitrogen-containing graphene thin films

Publication year: 2011 Source: Materials Science and Engineering: B, Available online 12 November 2011 Satoru Suzuki, Hiroki Hibino Boron and nitrogen-incorporated graphene thin films were grown on polycrystalline Ni substrates by thermal chemical vapor deposition using separate boron- and nitrogen-containing feedstocks. Boron and nitrogen atoms were incorporated in the film in almost equal amounts and the total content reached ∼28%

Publication year: 2011 Source: Materials Science and Engineering: B, Available online 12 November 2011 Satoru Suzuki, Hiroki Hibino Boron and nitrogen-incorporated graphene thin films were grown on polycrystalline Ni substrates by thermal chemical vapor deposition using separate boron- and nitrogen-containing feedstocks. Boron and nitrogen atoms were incorporated in the film in almost equal amounts and the total content reached ∼28%

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Chemical vapor deposition of boron- and nitrogen-containing graphene thin films